Stage system, exposure apparatus, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsKotaro Akutsu, Nobushige Korenaga, Mitsuru Inoue
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AssigneeCanon Kabushiki Kaisha
InventorsKotaro Akutsu, Nobushige Korenaga, Mitsuru Inoue
Estimating the term…
A stage system including a first fixed guide having a first guide surface being parallel to a first direction and a second direction being orthogonal to the first direction, a first movable guide to be guided by the first fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about a third direction being orthogonal to the first and second directions, the first movable guide extending in the second direction, a second fixed guide having a second guide surface being parallel to the first and second directions, a second movable guide to be guided by the second fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about the third direction, the second movable guide having a second guide extending in the first direction, and a movable member to be guided in the first and second directions by the first and second movable guides.
A stage system, comprising:
A stage system, comprising:
A stage system, comprising:
A device manufacturing method comprising:
Dependencies are inferred from the claim text.