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US 7,030,040 B2Granted
Selectively growing a polymeric material on a semiconductor substrate
AssigneeIntel Corporation
InventorsMichael D. Goodner, Grant Kloster
Life of this patent
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Abstract
A surface may be selectively coated with a polymer using an induced surface grafting or polymerization reaction. The reaction proceeds in those regions that are polymerizable and not in other regions. Thus, a semiconductor structure having organic regions and metal regions exposed, for example, may have the organic polymers formed selectively on the organic regions and not on the unpolymerizable or metal regions.
Claims16
A method comprising:
- forming a semiconductor substrate having a first exposed polymerizable surface and a second exposed unpolymerizable surface;
- and
- causing polymerization to occur selectively on the polymerizable surface while avoiding polymerization on the unpolymerizable surface to form a surface coating that selectively covers the polymerizable surface.
A method comprising:
- forming a first metal section extending through layers of dielectric;
- selectively forming a polymer on said exposed first metal section and not on said dielectric;
- covering said polymer with additional dielectric layers;
- and
- forming a second metal section through said additional dielectric layers to said first metal section.
2 more elements
Dependencies are inferred from the claim text.