Photoresist and organic antireflective coating compositions
AssigneeRohm and Haas Electronic Materials LLC
InventorsRichard J. Carey, Peter Trefonas, III, Michael J. Kaufman
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Abstract
Methods are provides methods are provided to prepare photoresist and organic antireflective coating composition with a filter having a mean pore size of less than about 0.4 microns. Photoresist compositions and antireflective coatings produced by such methods can provide manufactured microelectronic devices that have significantly reduced defects. Photoresist and antireflective compositions obtainable by such methods also are provided.
Claims13
A method for preparing a photoresist composition, comprising filtering a photoresist composition with a filter having a mean pore size of about 0.03 microns or less, wherein the filter comprises a polymide filter membrane.
A method for preparing a photoresist composition, comprising filtering a photoresist composition through a filter having a pore size of about 0.03 microns or less, wherein the filter membrane a Nylon material.
A method for preparing an organic antireflective coating composition for use with an overcoated photoresist composition, comprising filtering an organic coating composition with a filter having a mean pore size of about 0.03 microns or less, wherein the filter membrane comprises a Nylon material.
Dependencies are inferred from the claim text.