US 7,029,798 B1 · Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter

Abstract

A method of forming a topographical pattern in a surface of a resist layer, comprising sequential steps of: (a) providing a substrate having a surface; (b) forming a desired thickness resist material layer on the substrate surface; (c) subjecting selected areas of the surface of the resist layer to exposure to an energy beam to form therein a latent image of a desired topographical pattern to be formed therein; (d) contacting the surface of the resist layer with a liquid developing solution comprising a preselected solvent for developing the latent image into the desired topographical pattern while simultaneously supplying ultrasonic energy thereto, the combination of supplying the ultrasonic energy to the preselected solvent providing an increased developing interval and improved image contrast between the exposed and unexposed areas of the layer of resist material, relative to when the liquid developing solution does not comprise the preselected solvent and the ultrasonic energy is not supplied thereto.

Claims12

Dependent claims

A method of forming a topographical pattern in a surface of a resist layer, comprising sequential steps of:

(a) providing a substrate having a surface;
(b) forming a layer of a resist material of a desired thickness on said substrate surface, said resist layer having an exposed upper surface;
(c) subjecting selected areas of said exposed upper surface of said resist layer to exposure to an energy beam to form therein a latent image of a desired topographical pattern to be formed in said resist layer;
(d) contacting said exposed upper surface of said resist layer with a liquid developing solution comprising a preselected solvent for developing said latent image into said desired topographical pattern, and simultaneously supplying ultrasonic energy to said solution, the combination of supplying said ultrasonic energy to said liquid developing solution comprising said preselected solvent providing improved image contrast between the selected, exposed areas and unexposed areas of said resist layer and increasing an interval for developing said latent image from several seconds to tens of minutes, relative to when said liquid developing solution does not comprise said preselected solvent and said ultrasonic energy is not supplied thereto.

1 more element

A method of forming a topographical pattern in a surface of a resist layer, comprising sequential steps of:

(a) providing a substrate having a surface;
(b) forming a layer of a resist material of a desired thickness on said substrate surface, said resist layer having an exposed upper surface;
(c) subjecting selected areas of said exposed upper surface of said resist layer to exposure to an energy beam to form therein a latent image of a desired topographical pattern to be formed in said resist layer;
(d) contacting said exposed upper surface of said resist layer with a liquid developing solution comprising a preselected solvent for developing said latent image into said desired topographical pattern, and simultaneously supplying ultrasonic energy to said solution, the combination of supplying said ultrasonic energy to said liquid developing solution comprising said preselected solvent providing improved image contrast between the selected, exposed areas and unexposed areas of said resist layer, relative to when said liquid developing solution does not comprise said preselected solvent and said ultrasonic energy is not supplied thereto, wherein
said liquid developing solution comprises a solvent comprised of 50 vol. % isopropyl alcohol (IPA) and 50 vol. % de-ionized (DI) water, and the interval for developing said latent image is increased from several seconds to tens of minutes, relative to when said liquid developing solution is comprised of a solvent comprising n-amyl acetate and said ultrasonic energy is not supplied thereto.

2 more elements

Dependencies are inferred from the claim text.

Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter

Life of this patent

Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter

Life of this patent

Abstract

Claims12