Scratchable hiding layer-forming silicone composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKenji Yamamoto, Katsuma Baba, Masahiko Ogawa
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKenji Yamamoto, Katsuma Baba, Masahiko Ogawa
Estimating the term…
A hiding layer-forming silicone composition comprising (A) a diorganopolysiloxane comprising structural units of formula (1) and having an average degree of polymerization of at least 50, wherein R1 is alkyl or aryl, and R2 is alkyl, aryl, alkenyl, alkoxy, alkoxyalkoxy, hydroxyl or epoxy, (B) an organopolysiloxane comprising structural units of formulae (2) and (3): (R1—)n(R2—)3−nSi—O— (2) wherein R1 and R2 are as defined above, n is an integer of 1 to 3, (C) an inorganic powder opacifier, (D) a curing catalyst, and (E) an organic solvent is effectively curable and capable of forming a hiding layer which temporarily adheres well to various substrates of paper, synthetic paper and plastic film while it remains scratchable.
A hiding layer-forming silicone composition comprising
A hiding layer-forming silicone composition comprising
A substrate having an image thereon, wherein said image is coated with a scratchable hiding layer silicon film composition comprising
A substrate having an image thereon, wherein said image is coated with a scratchable hiding layer silicon film composition comprising
Dependencies are inferred from the claim text.