Retaining ring assembly for use in chemical mechanical polishing

An annular ring assembly for use on a chemical mechanical polisher, said assembly comprising:

• a lower annular retaining ring defining an annular projection thereon, said projection defining opposed side walls and said side walls defining a pair of opposed inwardly directed substantially v-shaped grooves extending about said projection;
• an upper annular backing defining an open annular channel therein, said channel defining opposed side walls and being adapted to receive said projection on said retaining ring upon said ring and said backing being urged into adjacent juxtaposition, said side walls on said backing being inwardly tapered so as to define a pair of opposed outwardly directed substantially v-shaped grooves therein, said outwardly directed grooves being spaced outwardly of and above said inwardly directed grooves on said retaining ring;
• and a pair of coil springs extending about said annular projection, each of said springs being at least partially disposed in a compressed disposition within and between an inwardly and an outwardly substantially v-shaped groove whereby said ring portion is releasably secured to said backing in a mating relationship.