US 7,024,334 B2Granted

Method and system for yield similarity of semiconductor devices

AssigneeSemiconductor Manufacturing International (Shanghai) Corporation

InventorEugene Wang

Life of this patent

Estimating the term…

Loading patent…

Abstract

A method and system for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices, providing a second plurality of semiconductor devices, obtaining a first plurality of yields associated with a first yield, and obtaining a second plurality of yields associated with a second yield. Additionally, the method includes performing a first statistical analysis for the first plurality of yields, determining a first statistical distribution, performing a second statistical analysis for the second plurality of yields, and determining a second statistical distribution. Moreover, the method includes processing information associated with the first statistical distribution and the second statistical distribution, and determining an indicator. Also, the method includes processing information associated with the indicator, determining a confidence level, processing information associated with the confidence level, and determining whether the first yield and the second yield are similar.

Claims20

Dependent claims

A method for yield similarity of semiconductor devices, the method comprising:

providing a first plurality of semiconductor devices;
providing a second plurality of semiconductor devices;
obtaining a first plurality of yields associated with a first yield related to the first plurality of semiconductor devices;
obtaining a second plurality of yields associated with a second yield related to the second plurality of semiconductor devices;
performing a first statistical analysis for the first plurality of yields;
determining a first statistical distribution based on at least information associated with the first statistical analysis;
performing a second statistical analysis for the second plurality of yields;
determining a second statistical distribution based on at least information associated with the second statistical analysis;
processing information associated with the first statistical distribution and the second statistical distribution;
determining an indicator based on at least information associated with the first statistical distribution and the second statistical distribution, the indicator being associated with an overlapping area between the first statistical distribution and the second statistical distribution;
processing information associated with the indicator;
determining a confidence level based on at least information associated with the indicator;
processing information associated with the confidence level;
determining whether the first yield and the second yield are similar based on at least information associated with the confidence level;
wherein the confidence level is associated with a second order of the indicator and a first order of the indicator;
wherein the determining whether the first yield and the second yield are similar includes:
if the confidence level is equal to or higher than 95%, determining the first yield and the second yield to be similar;
if the confidence level is lower than 95%, determining the first yield and the second yield to be not similar.

15 more elements

A computer-readable medium including instructions for yield similarity of semiconductor devices, the computer-readable medium comprising:

one or more instructions for receiving a first plurality of yields associated with a first yield related to a first plurality of semiconductor devices;
one or more instructions for receiving a second plurality of yields associated with a second yield related to a second plurality of semiconductor devices;
one or more instructions for performing a first statistical analysis for the first plurality of yields;
one or more instructions for determining a first statistical distribution based on at least information associated with the first statistical analysis;
one or more instructions for performing a second statistical analysis for the second plurality of yields;
one or more instructions for determining a second statistical distribution based on at least information associated with the second statistical analysis;
one or more instructions for processing information associated with the first statistical distribution and the second statistical distribution;
one or more instructions for determining an indicator based on at least information associated with the first statistical distribution and the second statistical distribution, the indicator being associated with an overlapping area between the first statistical distribution and the second statistical distribution;
one or more instructions for processing information associated with the indicator;
one or more instructions for determining a confidence level based on at least information associated with the indicator;
one or more instructions for processing information associated with the confidence level;
one or more instructions for determining whether the first yield and the second yield are similar based on at least information associated with the confidence level;
wherein the confidence level is associated with a second order of the indicator and a first order of the indicator;
wherein the one or more instructions for determining whether the first yield and the second yield are similar includes:
one or more instructions for if the confidence level is equal to or higher than 95%, determining the first yield and the second yield to be similar;
one or more instructions for if the confidence level is lower than 95%, determining the first yield and the second yield to be not similar.

13 more elements

Dependencies are inferred from the claim text.