Skiving device and methods of use
AssigneeEastman Kodak Company
InventorsMegan L. Weiner, Charles M. Rankin, Jr., John P. Macauley, Theodore K. Ricks, Rusty J. Coleman
Life of this patent
Estimating the term…
Abstract
A skiving device including at least one nozzle tip and at least one roller is described, as well as methods of using the skiving device. Skives made with the skiving device are clean, neat, and do not damage underlying layers.
Claims79
A skiving device comprising at least one roller having a surface and at least one nozzle tip comprising a proximal end, a distal end, and a longitudinal axis extending from the proximal end to the distal end, the proximal end having an opening defined by a first face including a first edge and a second face including a second edge.
A process for selectively removing material from a substrate, the substrate comprising a support and a layer, the process comprising:
- providing the substrate to a skiving device comprising at least one roller and at least one nozzle tip;
- contacting the surface of the at least one roller and the at least one nozzle tip with the layer;
- and
- moving said skiving device in relation to the substrate to remove at least a portion of the layer with the roller, the nozzle tip, or both, and expose at least a portion of the support, wherein the nozzle tip comprises a proximal end, a distal end and a longitudinal axis extending from the proximal end to the distal end, the proximal end having an opening defined by a first edge and a second edge.
Dependencies are inferred from the claim text.