Illumination system and exposure apparatus and method
AssigneeNikon Corporation
InventorHideki Komatsuda
Life of this patent
Estimating the term…
Abstract
An optical apparatus and method guide EUV radiation to a predetermined surface. A radiation source supplies EUV radiation having a certain dispersion angle. An illumination optical system having a reflective integrator forms a secondary radiation source having a predetermined shape based on the EUV radiation supplied from the radiation source. A projection optical system is arranged in an optical path between a reflective mask and the predetermined surface and forms an image of the reflective mask onto the predetermined surface based on the EUV radiation from the reflective mask. The secondary radiation source having the predetermined shape has a shape that is a substantially circular shape, an annular shape, or a multipolar shape.
Claims20
An optical apparatus for guiding EUV radiation to a predetermined surface, comprising:
- a radiation source which supplies EUV radiation;
- an illumination optical system having a reflective integrator which forms a secondary radiation source having a predetermined shape based on the EUV radiation supplied from the radiation source;
- and
- a projection optical system which is arranged in an optical path between a reflective mask and the predetermined surface and which forms an image of the reflective mask onto the predetermined surface based on the EUV radiation from the reflective mask,
- wherein the secondary radiation source having the predetermined shape has a shape which is adjustable.
A method of guiding EUV radiation to a predetermined surface, comprising the steps of:
- supplying EUV radiation;
- forming a secondary radiation source having a predetermined shape using a reflective integrator, based on the supplied EUV radiation;
- guiding the EUV radiation from the reflective integrator to a reflective mask;
- forming an image of the reflective mask using a projection optical system based on the EUV radiation from the reflective mask;
- and
- adjusting a shape of the secondary radiation source.
Dependencies are inferred from the claim text.