Multiple exposure method

An exposure apparatus comprising:

• an illumination optical system for illuminating a predetermined mask;
• a projection optical system for projecting light from the mask to a predetermined exposure region;
• first exposure means for illuminating the mask under a first illumination condition and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern;
• and
• second exposure means for illuminating the mask under a second illumination condition, different from the first illumination condition, and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern,
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out simultaneously, prior to a development process.

An exposure apparatus comprising:

• an illumination optical system for illuminating a predetermined mask;
• a projection optical system for projecting light from the mask to a predetermined exposure region;
• first exposure means for illuminating the mask with a first sigma and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern;
• and
• second exposure means for illuminating the mask with a second sigma, different from the first sigma, and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern,
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out prior to a development process, and
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out simultaneously.

An exposure apparatus comprising:

• an illumination optical system for illuminating a predetermined mask;
• a projection optical system for projecting light from the mask to a predetermined exposure region;
• first exposure means for illuminating the mask with a first numerical aperture and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern;
• and
• second exposure means for illuminating the mask with a second numerical aperture, different from the first numerical aperture, and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern,
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out prior to a development process, and
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out simultaneously.

An exposure apparatus comprising:

• an illumination optical system for illuminating a predetermined mask;
• a projection optical system for projecting light from the mask to a predetermined exposure region;
• first exposure means for obliquely illuminating the mask and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern;
• and
• second exposure means for perpendicularly illuminating the mask and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern,
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out prior to a development process, and
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out simultaneously.

An exposure apparatus comprising:

• an illumination optical system for illuminating a predetermined mask;
• a projection optical system for projecting light from the mask to a predetermined exposure region;
• first exposure means for illuminating the mask under a first illumination condition and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern;
• and
• second exposure means for illuminating the mask under a second illumination condition, different from the first illumination condition, and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern,
• wherein the mask has a repetition pattern comprising repeatedly disposed basic patterns, being defined by light transmissive portions,
• wherein light passed through adjacent basic patterns of the repetition pattern have a mutual optical phase difference of about 180 degrees, and
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out simultaneously, prior to a development process.

An exposure apparatus, comprising:

• first exposure means for illuminating a predetermined mask with light of a predetermined wavelength under a first mask-illumination condition, to print a first pattern on a predetermined exposure region;
• and
• second exposure means for illuminating the predetermined mask with light of the predetermined wavelength under a second mask-illumination condition, to print a second pattern on the predetermined exposure region,
• wherein a first exposure by said first exposure means and a second exposure by said second exposure means are carried out simultaneously, prior to a development process, and
• wherein the state of polarization of the light used by said first exposure means for illumination of the predetermined mask is different from the state of polarization of the light used by said second exposure means for illumination of the predetermined mask.