Multibeam exposure device
AssigneeFuji Photo Film Co., Ltd.
InventorTakeshi Fukuda
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AssigneeFuji Photo Film Co., Ltd.
InventorTakeshi Fukuda
Estimating the term…
A multibeam exposure device carrying out exposure processing by irradiating, onto an exposure surface of a photosensitive material, an exposure beam obtained by modulating a light beam, by a spatial light modulator and in accordance with an image to be exposed and formed, the multibeam exposure device having: an opening plate having an opening disposed on the exposure surface and blocking light which is other than an object of measurement of light quantity data at the spatial light modulator, the opening allowing passage of the exposure beam which corresponds to a pixel which is an object of measurement of light quantity data at the spatial light modulator; a feeding operation mechanism moving the opening plate such that the opening is moved in a direction intersecting a scanning direction at a time of scan-exposure; and a light-receiving element measuring a light quantity of the exposure beam which passes through the opening.
A multibeam exposure device carrying out exposure processing by irradiating, onto an exposure surface of a photosensitive material, an exposure beam obtained by modulating, by a spatial light modulator and in accordance with an image to be exposed and formed, a light beam which is emitted from a light source, the multibeam exposure device comprising:
A multibeam exposure device scanning an exposure member in a given direction and forming an image on an exposure surface of the exposure member, the multibeam exposure device comprising:
An exposure method for carrying out exposure processing by irradiating, onto an exposure surface of a photosensitive material, an exposure beam obtained by modulating, by a spatial light modulator and in accordance with an image to be exposed and formed, a light beam which is emitted from a light source, the exposure method comprising:
Dependencies are inferred from the claim text.