Slot array antenna and plasma processing apparatus

A slot array antenna, comprising:

• a power-feeding waveguide for feeding microwave power;
• and
• a plurality of rectangular radiating waveguides connected to a plurality of windows which are disposed alone the longitudinal direction of the power-feeding waveguide, so as to guide the microwave power from the plurality of windows to the outside of the antenna;
• wherein each of the radiating waveguides has a plurality of slots disposed along the longitudinal direction of the radiating waveguide;
• the interval “d” between the adjacent slots is substantially the same as the wavelength λm of the microwave in the rectangular radiating waveguide;
• and a coupling window having a variable width is disposed at the power-feeding portions for feeding power from the power-feeding waveguide to the radiating waveguide.

A plasma processing apparatus comprising:

• a plasma processing chamber for subjecting an object to a plasma treatment;
• and
• antenna means for guiding microwave power into the plasma processing chamber so as to generate plasma in the plasma processing chamber;
• wherein the antenna means comprises:
• a power-feeding waveguide for feeding microwave power;
• and a plurality of rectangular radiating waveguides connected to a plurality of windows which are disposed along the longitudinal direction of the power-feeding waveguide, so as to guide the microwave power from the plurality of windows to the outside of the antenna, wherein each of the radiating waveguides has a plurality of slots disposed along the longitudinal direction of the radiating waveguide;
• and the interval “d” between adjacent slots is substantially the same as the wavelength λm of the microwave in the rectangular radiating waveguide;
• and the slots formed on one side of the radiating waveguide are disposed such that they gradually deviate from the center axis in the longitudinal direction of the radiating waveguide.

A plasma processing apparatus comprising:

• a plasma processing chamber for subjecting an object to be processed to a plasma treatment;
• and
• antenna means for guiding microwave power into the plasma processing chamber so as to generate plasma in the plasma processing chamber;
• wherein the antenna means comprises:
• a power-feeding waveguide for feeding microwave power;
• and
• a plurality of rectangular radiating waveguides connected to a plurality of windows which are disposed along the longitudinal direction of the power-feeding waveguide, so as to guide the microwave power from the plurality of windows to the outside of the antenna,
• wherein each of the radiating waveguides has a plurality of slots disposed along the longitudinal direction of the radiating waveguide;
• and the interval “d” between adjacent slots is substantially the same as the wavelength λm of the microwave in the rectangular radiating waveguide;
• and a coupling window having a variable width is disposed at the power-feeding portions for feeding power from the power-feeding waveguide to the radiating waveguide.