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US 7,023,128 B2Granted
Dipole ion source
AssigneeApplied Process Technologies, Inc.
InventorJohn Madocks
Life of this patent
Estimating the term…
Abstract
A dipole ion source (FIG. 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.
Claims19
A dipole ion source comprising:
- a substrate;
- a pole, wherein a gap is defined between the substrate and the pole;
- an unsymmetrical mirror magnetic field comprising a compressed end and a less compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field, wherein the pole and the substrate are charged to contain electrons;
- and
- an anode positioned to create an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical mirror magnetic field serves to focus an ion beam on the substrate.
2 more elements
A dipole ion source comprising:
- a substrate, wherein the substrate is charged to contain electrons;
- a pole, wherein a gap is defined between the substrate and the pole;
- an unsymmetrical magnetic field comprising a compressed end and a less compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field;
- further wherein at least a portion of the magnetic field adjacent to the pole is at least two times stronger near the pole than adjacent to the substrate surface;
- and
- an anode positioned to create an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein an ion beam is focused on the substrate;
- wherein the substrate is moved in relation to the magnetic field, thereby providing uniformity in treatment.
4 more elements
Dependencies are inferred from the claim text.