Solid-state imaging device with improved image sensitivity

A solid-state imaging device comprising:

• a semiconductor substrate;
• a photoreceiving region provided on the semiconductor substrate;
• a plurality of light-sensitive elements provided in the photoreceiving region;
• a plurality of apertures, which are provided over the light-sensitive elements, for delivering an incident light to the light-sensitive elements;
• a plurality of reflecting walls provided over the light-sensitive elements and the apertures so as to oppose each other across the apertures;
• a plurality of a first micro lenses provided between the reflecting walls;
• and
• a plurality of a second micro lenses provided over the reflecting walls and the apertures,
• wherein the plurality of the first and second micro lenses disposed in an inner periphery of the photoreceiving region, and the plurality of reflecting walls corresponding to the first and second micro lenses are disposed such that a center of each of the first micro lenses, a center of each of the second micro lenses, and a center of each of the reflecting walls opposing each other are displaced from a center of the aperture toward a center of the photoreceiving region, and
• an amount of displacement between the center of the photoreceiving region and the center of the reflecting walls, an amount of displacement between the center of the photoreceiving region and the center of the first micro lens are smaller than that of displacement between the center of the photoreceiving region and the center of the second micro lens.