Method for making thin film devices intended for solar cells or silicon-on-insulator (SOI) applications
AssigneeInteruniversitair Microelektronica Centrum (IMEC)
InventorsChetan Singh Solanki, Renat Bilyalov, Jef Poortmans
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Abstract
In one inventive aspect, a thin film device is manufactured by (a) forming a porous semiconductor layer in the form of a thin film on an original substrate, the formation being immediately followed by (b) separation of the thin film by a lift-off process from the original substrate; (c) transfer of the thin film to a dummy support, the thin film not being attached to the dummy support; (d) fabrication of a device on top of the thin film; and (e) transfer and attachment of said device on said thin film on a foreign substrate.
Claims15
A method of manufacturing a semiconductor device, the method comprising:
- (a) forming a porous semiconductor layer in the form of a thin film on an original substrate, the forming being immediately followed by
- (b) separating the thin film by a lift-off process from the original substrate;
- (c) transferring the thin film to a dummy support, the thin film not being attached to the dummy support;
- (d) fabricating a device on top of the thin film;
- and
- (e) attaching the thin film with the device fabricated on the thin film to a foreign substrate.
A method of manufacturing a thin film device comprising:
- fabricating a device on a free-standing thin film;
- and
- depositing the thin film device on a substrate.
A method of manufacturing a thin film device comprising:
- forming a thin film on an original substrate;
- separating the thin film from the original substrate;
- transferring the thin film to a dummy support so that the thin film is free-standing;
- forming an active layer on the thin film;
- and
- attaching the active layer and the thin film to a foreign substrate.
Dependencies are inferred from the claim text.