Thin film transistor array substrate and manufacturing method thereof

A method of manufacturing a thin film transistor array substrate of a liquid crystal display, comprising the steps of:

• forming a first set of structures on a substrate using a first mask process, wherein the first set of structures includes a gate line, a gate electrode, a gate pad, a data pad, and a pixel electrode, wherein the first set of structures are comprised of a lower transparent conductive pattern and an upper metal pattern;
• forming a gate insulating layer, semiconductive layer, and ohmic contract layer over the first set of structures and over the substrate;
• forming a photo-resist pattern over the ohmic contact layer that is over the gate line and over the ohmic contact layer that is over the gate electrode;
• forming a second set of structures using a second mask process, wherein the second set of structures includes both a gate insulating pattern and a semiconductor pattern over the gate electrode, and a gate insulating pattern and a semiconductor pattern over the gate line, and wherein the second mask process exposes the pixel electrode, the data pad, and the gate pad;
• depositing a metal layer over the substrate, over the pixel electrode, over the data pad, over the gate pad, and over the second set of structures;
• and
• etching the deposited metal layer using a third mask process to form spaced apart source and drain electrodes, a gate pad contact hole, a data pad contact hole, data lines, and a storage electrode;
• wherein the drain electrode electrically contacts the pixel electrode, wherein the storage electrode electrically contacts the pixel electrode, and wherein the storage electrode is over at least part of the gate line.