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US 7,022,443 B2Granted
Compensation of reflective mask effects in lithography systems
AssigneeIntel Corporation
InventorsManish Chandhok, Michael Goldstein
Life of this patent
Estimating the term…
Abstract
Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.
Claims11
A method comprising:
- determining, based on at least one of a pitch and a feature size of features to be patterned using a reflective mask, an optical effect caused by the reflective mask in a lithographic system;
- and
- introducing an aberration in a reflective surface in an optical path including the reflective mask, said aberration operative to produce an optical effect similar to the optical effect caused by the reflective mask.
Dependencies are inferred from the claim text.