Photomask for forming small contact hole array and methods of fabricating and using the same
AssigneeSamsung Electronics Co., Ltd.
InventorIn-sung Kim
Life of this patent
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Abstract
Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type opaque patterns being formed on the transparent substrate, for defining floodlighting portions for forming patterns; and phase-shifting regions being arranged on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes. A fine and dense contact hole array can be easily formed using the photomask together with a customized illumination. Therefore, a fine contact hole of a good quality can be formed directly on a photoresist using the photomask without additional processes.
Claims12
A photomask comprising:
- a transparent substrate;
- a plurality of line-type opaque patterns formed on the transparent substrate, for defining floodlighting portions for forming patterns;
- and
- phase-shifting regions arranged on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes.
A method of fabricating a photomask, comprising:
- forming a plurality of line-type opaque patterns on a transparent substrate, the opaque patterns defining floodlighting portions for forming patterns;
- and
- forming phase-shifting regions on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes.
Dependencies are inferred from the claim text.