Methods for forming a conductor on a dielectric
AssigneeAgilent Technologies, Inc.
InventorsJohn F. Casey, Lewis R. Dove, Ling Liu, James R. Drehle, R. Frederick Rau, Jr., Rosemary O. Johnson
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Abstract
Disclosed is a method for forming a conductor on a dielectric. The method commences with the deposition of a conductive thickfilm on the dielectric, followed by a “subsintering” of the conductive thickfilm. Either before or after the subsintering, the conductive thickfilm is patterned to define at least one conductor. After subsintering, the conductive thickfilm is etched to expose the conductor(s), and the conductor(s) are then fired. A brief chemical etch may be used after the final firing step if improved wire-bondability is required.
Claims15
A method for forming a conductor on a dielectric, comprising:
- a) depositing a conductive thickfilm on the dielectric;
- b) subsintering the conductive thickfilm;
- c) patterning the conductive thickfilm to define at least one conductor;
- d) etching the conductive thickfilm to expose the at least one conductor;
- and
- e) firing the at least one conductor at a full sintering temperature.
Dependencies are inferred from the claim text.