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US 7,018,944 B1Granted
Apparatus and method for nanoscale pattern generation
AssigneeNanoLab, Inc.
InventorDavid L. Carnahan
Life of this patent
Estimating the term…
Abstract
A method and apparatus that produces highly ordered, nanosized particle arrays on various substrates. These regular arrays may be used as masks to deposit and grow other nanoscale materials.
Claims43
A method for generating a mask:
- having a nanoscale pattern, the method comprising:
- suspending a periodic arrangement of objects in a suspension liquid, supporting the suspension liquid on a top surface of a supporting liquid at a first given height above a top surface of a substrate;
- and
- adjusting at least one from a group consisting of (1) the suspension liquid supported on the top surface of the supporting liquid and (2) the top surface of the substrate, to position the top surface of the supporting liquid below the top surface of the substrate so as to deposit the periodic arrangement of objects onto the top surface of the substrate from the suspension on the top surface of the supporting liquid;
- wherein the periodic arrangement of objects is maintained over a given area.
2 more elements
A method for creating a deposition having a nanoscale pattern on a substrate, the method comprising:
- suspending a periodic arrangement of objects in a suspension liquid, supporting the suspension liquid on a top surface of a supporting liquid at a first given height above a top surface of a substrate;
- adjusting at least one from a group consisting of (1) the suspension liquid supported on the top surface of the fluid and (2) the top surface of the substrate, to position the top surface of the supporting liquid below the top surface of the substrate so as to deposit the periodic arrangement of objects onto the top surface of the substrate from the suspension on the top surface of the fluid, whereby to create a mask;
- and
- depositing a material through interstices contained in the mask so as to create a pattern on the substrate.
1 more element
Dependencies are inferred from the claim text.