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US 7,018,938 B2Granted
Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning
AssigneeIntel Corporation
InventorsSubramanyam A. Iyer, Justin K. Brask, Vijayakumar S. Ramachandrarao
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Abstract
Radiant energy may be applied to a photochemically susceptible etching or conditioning solution to enable precise control of the removal of material or alteration of the top surface of a wafer during the fabrication of semiconductor integrated circuits. A particular condition may be detected during the course of photoactivated generation of free radicals or molecular activation to control the further generation of said species by controlling the radiant energy exposure of a wafer.
Claims9
A method comprising:
- exposing a semiconductor wafer having a photochemically susceptible solution thereon to radiation having a first characteristic;
- detecting a condition related to radiation exposure on said wafer while exposing said wafer to radiation having said first characteristic;
- and
- altering the first characteristic of the radiation in response to the detection of said condition and continuing the exposure of said wafer to radiation having an altered, second characteristic.
1 more element
Dependencies are inferred from the claim text.