US 7,018,932 B2 · Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device

Abstract

A method for manufacturing a semiconductor device including, forming a photosensitive-film on a substrate, carrying the substrate on which the photosensitive-film is formed, to an exposure device provided with a mask in which an on-mask-inspection-mark and an on-mask-device-pattern are formed, selectively exposing the photosensitive-film to light to transfer the on-mask-inspection-mark to the photosensitive-film to form a latent-image of the inspection-mark on the photosensitive-film, heating at least that area of the photosensitive-film in which the latent-image of the inspection-mark is formed, measuring the inspection-mark, changing set-values for the exposure device used for the selective exposure, on the basis of result of the measurement so that exposure conditions conform to the set-values, exposing the photosensitive-film on the basis of the changed set-values to transfer the on-mask-device-pattern to the photosensitive-film to form a latent image of the device-pattern on the photosensitive-film, heating an entire surface of the photosensitive-film, and developing the photosensitive-film.

Claims16

Dependent claims

A method for manufacturing a semiconductor device, the method comprising:

forming a photosensitive film on a main surface of a semiconductor substrate;
carrying the semiconductor substrate on which the photosensitive film is formed, to an exposure device provided with a mask in which an on-mask inspection mark and an on-mask device pattern are formed to form an inspection mark and a device pattern, respectively, on the photosensitive film;
selectively exposing the photosensitive film to light to transfer the on-mask inspection mark to the photosensitive film to form a latent image of the inspection mark on the photosensitive film;
heating at least that area of the photosensitive film in which the latent image of the inspection mark is formed, to relieve the image of the inspection mark;
measuring the relieved image of the inspection mark;
changing set values for the exposure device used for the selective exposure, on the basis of result of the measurement so that exposure conditions conform to the set values;
exposing the photosensitive film on the basis of the changed set values to transfer the on-mask device pattern to the photosensitive film to form a latent image of the device pattern on the photosensitive film;
heating an entire surface of the photosensitive film;
and
developing the photosensitive film.

7 more elements

An apparatus for manufacturing a semiconductor device, the apparatus comprising:

a substrate holding section configured to hold a substrate including a semiconductor substrate a potosensitive film above the semiconductor substrate, and a first alignment mark between the semiconductor substrate and the photosensitive film;
an exposure mask holding section configured to hold an exposure mask having an on-mask device pattern area and an on-mask inspection mark area, wherein the on-mask inspection mark area includes an on-mask second alignment mark, and wherein the on-mask inspection mark area is to be transferred to a region of the photosensitive film to form a latent image of the second alignment mark on the photosensitive film;
a light source;
an illuminating optical system configured to irradiate the exposure mask with a light from the light source;
a projecting optical system configured to project light transmitted through the exposure mask on the photosensitive film;
an alignment mark measuring optical system configured to detect a position of the first alignment mark and the latent image of the second alignment mark;
and
a heating portion configured to selectively heat the region of the photosensitive film by irradiating the region with light.

5 more elements

Dependencies are inferred from the claim text.

Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device

Life of this patent

Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device

Life of this patent

Abstract

Claims16