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US 7,018,506 B2Granted
Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsToshiaki Hongoh, Naoki Matsumoto, Chishio Koshimizu
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Abstract
A plasma processing apparatus comprises a plate that separates a high frequency induction antenna from a vacuum chamber. The plate comprises a nonmagnetic metal plate that has an opening and a dielectric material member that seals the opening. The area of the nonmagnetic metal plate is larger than the area of the dielectric material member.
Claims9
A plasma processing apparatus, comprising:
- a vacuum chamber in which a workpiece to be processed can be arranged;
- a first plate, which forms an upper part of the vacuum chamber and comprises a first nonmagnetic metal body that has a first opening and a first dielectric material member that seals the first opening, wherein the area of the first nonmagnetic metal body is larger than the area of the first dielectric material member;
- a high frequency induction antenna, which is disposed outside the vacuum chamber and arranged over the first plate;
- and
- a second plate spaced from and facing the first plate, comprising a second nonmagnetic metal body that has a second opening and a second dielectric material member that seals the second opening;
- wherein the area of the second nonmagnetic metal body is larger than the area of said second dielectric material member;
- and
- wherein the second nonmagnetic metal body includes a plurality of holes, so that the second plate forms a showerhead with the first plate.
5 more elements
Dependencies are inferred from the claim text.