Gas cabinet including integrated effluent scrubber
AssigneeAdvanced Technology Materials, Inc.
InventorsMichael J. Wodjenski, Jose I. Arno
Life of this patent
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AssigneeAdvanced Technology Materials, Inc.
InventorsMichael J. Wodjenski, Jose I. Arno
Estimating the term…
A gas cabinet assembly for dispensing of gas to a process facility such as a semiconductor manufacturing tool. A purge gas dry scrubber is integrated with the gas flow circuitry and a venturi pump in the gas cabinet. Purge gas is flowed through the flow circuitry in the gas cabinet subsequent to on-stream dispensing of process gas through such flow circuitry, and forms a purge effluent including the residual process gas. The purge effluent is flowed through a dry scrubber unit to sorptively remove the process gas species from the purge effluent. The resultant process gas-depleted purge effluent is vented from the gas cabinet, e.g., into the ducting of the house exhaust system of the process facility. Monitoring of the relative depletion of the dry scrubbing medium in the dry scrubber may be carried out with endpoint detection, e.g., using colorimetric change techniques, toxic gas monitor devices, or PLC/CPU arrangements.
A gas delivery process wherein process gas from a gas supply vessel is flowed through flow circuitry in a gas cabinet and dispensed from the gas cabinet, and the flow circuitry subsequent to process gas dispensing is purged with a purge gas to remove residual process gas from the flow circuitry and yield a purge effluent including the purge gas and residual process gas from the flow circuitry, said process comprising contacting the purge effluent with a dry scrubbing medium that is effective to remove the process gas from the purge effluent and yield a process gas-depleted purge effluent, and pumping the process gas-depleted purge effluent out of the gas cabinet with a venturi pump.
A gas cabinet assembly for dispensing of gas to a process facility, said gas cabinet assembly comprising:
Dependencies are inferred from the claim text.