Air platen for leading edge and trailing edge control
AssigneeLam Research Corporation
InventorsAnthony de la Llera, Xuyen Pham, Cangshan Xu, David Wei, Tony Luong
Life of this patent
Estimating the term…
Abstract
An air platen assembly is described and includes a platen that has a plurality of concentric rings. Each of the rings has a plurality of openings in order to provide a cushion of air to a CMP belt. At least one of the rings extends beyond an outer edge of a wafer to be planarized by the CMP belt. A support is attached with the platen and has a plurality of air ports for pressurized air to pass to the rings of the platen. A gasket is positioned between the support and the platen and has a plurality of cutouts that align with the openings and the air ports. A base is also included and supports the support.
Claims15
An air platen assembly comprising:
- a platen having a plurality of concentric rings, each of said rings having a plurality of openings in order to provide a cushion of air to a CMP belt, at least an entire one of said plurality of rings extending beyond an outer edge of a wafer to be planarized by said CMP belt;
- two channels passing through said platen, said channels each having a plurality of passages extending upwardly from said channel to a top surface of said platen;
- a support attached with said platen, said support having a plurality of air ports for pressurized air to pass to said rings of said platen;
- a gasket positioned between said support and said platen, said gasket having a plurality of cutouts that align with said openings and said air ports;
- and
- a base that supports said support.
An air platen comprising:
- an inner zone having at least one row of openings to provide a cushion of air to a CMP belt, a midzone having at least one row of openings to provide a cushion of air to a CMP belt and an outerzone having at least one row of openings to provide a cushion of air to a CMP belt,
- at least one pressure regulator connected with said innerzone;
- at least one pressure regulator connected with said midzone;
- and
- at least one pressure regulator connected with said outerzone;
- and
- wherein at least one of said row of openings of the outerzone is oriented to extend beyond an outer edge of a wafer to be planarized by said CMP belt.
Dependencies are inferred from the claim text.