Inspection apparatus for inspecting resist removal width
AssigneeNidek Co., Ltd.
InventorsEiji Yonezawa, Tadashi Aoyama
Life of this patent
Estimating the term…
Abstract
An inspection apparatus for inspecting a resist boundary on a substrate having an outer surrounding portion, includes: an illumination unit which illuminates the outer surrounding portion of the substrate; a detector which detects light reflected from the outer surrounding portion; and a judgment unit which judges, based on light intensity of the detected reflected light, whether a resist removal width is proper.
Claims12
An inspection apparatus for inspecting a resist boundary on a substrate having an outer surrounding portion, the inspection apparatus comprising:
- an illumination unit which illuminates the outer surrounding portion of the substrate;
- a detector which detects light reflected from the outer surrounding portion;
- and
- a judgment unit which judges, based on light intensity of the detected reflected light, whether a resist removal width is proper,
- wherein the illumination unit illuminates the outer surrounding portion with a plurality of narrow band light which are different in center wavelength, and
- the judgment unit judges, based on a wavelength characteristic obtained from the light intensity for each wavelength, whether the resist removal width is proper.
An inspection apparatus for inspecting a resist boundary on a substrate having an outer surrounding portion, the inspection apparatus comprising:
- an illumination unit which illuminates the outer surrounding portion of the substrate;
- a detector which detects light reflected from the outer surrounding portion;
- and
- a judgment unit which judges, based on light intensity of the detected reflected light, whether a resist removal width is proper,
- wherein the judgment unit obtains a winding of the resist boundary based on an obtained resist boundary position, and judges, based on the obtained winding, whether the resist removal width is proper.
An inspection apparatus for inspecting a resist boundary on a substrate having an outer surrounding portion, the inspection apparatus comprising:
- an illumination unit which illuminates the outer surrounding portion of the substrate;
- a light detector which detects light reflected from the outer surrounding portion;
- and
- an image processor that stores a program for judging, based on light intensity of the detected reflected light, whether a resist removal width is proper,
- wherein the illumination unit illuminates the outer surrounding portion with a plurality of narrow band light which are different in center wavelength, and
- the program includes a program for judging, based on a wavelength characteristic obtained from the light intensity for each wavelength, whether the resist removal width is proper.
An inspection apparatus for inspecting a resist boundary on a substrate having an outer surrounding portion, the inspection apparatus comprising:
- an illumination unit which illuminates the outer surrounding portion of the substrate;
- a light detector which detects light reflected from the outer surrounding portion;
- and
- an image processor that stores a program for judging, based on light intensity of the detected reflected light, whether a resist removal width is proper,
- wherein the program causes the image processor to execute a step of obtaining a winding of the resist boundary based on an obtained resist boundary position, and judging, based on the obtained winding, whether the resist removal width is proper.
Dependencies are inferred from the claim text.