Amine, amide, sulphonamide and carbamate derivatives of benzalmalonic salts and photoprotective cosmetic compositions comprised thereof
AssigneeL'oreal
InventorsHervé Richard, Bernadette Luppi
Life of this patent
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Abstract
Stable, topically applicable cosmetic/dermatological sunscreen compositions, well suited for the UV-photoprotection of human skin/keratinous materials, contain a thus effective amount of at least one novel amine, amide, sulphonamide or carbamate substituted benzalmalonic salt compound.
Claims21
An amine, amide, sulphonamide or carbamate substituted benzalmalonic salt compound having the following general formula (1) or (2):
- in which X1 is hydrogen or a radical R3—(C═O)—, R3—SO2— or R3—O—(C═O)—;
- X2 is a divalent radical of formula —(C═O)—R′3—(C═O)—, —SO2—R′3—SO2— or —(C═O)—O—R′3—O—(C═O)—;
- R2 is a linear or branched C1-8 alkyl radical n is 0, 1 or 2;
- R3 is a linear or branched C1–C30 alkyl radical or C3–C30 alkenyl radical, optionally bearing one or more hydroxyl substituents and optionally containing in the hydrocarbon chain one or more heteroatoms selected from among oxygen, nitrogen and silicon atoms, or an optionally substituted C6–C20 aryl radical;
- R′3 is a single valence bond or a linear or branched divalent C1–C30 alkylene or C3–C30 alkenylene radical, optionally bearing one or more hydroxyl substituents and optionally containing in the hydrocarbon chain one or more heteroatoms selected from among oxygen, nitrogen and silicon atoms;
- and the radicals A, which may be identical or different, are each an alkali metal cation, an ammonium group, a C1–C20 mono-, di- or trialkylammonium radical, a C2–C20 mono-, di- or trialkanolammonium radical, or a C5–C8 quaternary nitrogen-containing heterocyclic ring member.
A topically applicable cosmetic/dermatological composition suited for the UV-photoprotection of human skin/keratinous materials, comprising an effective UV-photoprotecting amount of at least one amine, amide, sulphonamide or carbamate substituted benzalmalonic salt compound having the following general formula (1) or (2):
- in which X1 is hydrogen or a radical R3—(C═O)—, R3—SO2— or R3—O—(C═O)—;
- X2 is a divalent radical of formula —(C═O)—R′3—(C═O)—, —SO2—R′3—SO2— or —(C═O)—O—R′3—O—(C═O)—;
- R2 is a linear or or branched C1-8 alkyl radical;
- n is 0, 1 or 2;
- R3 is a linear or branched C1–C30 alkyl radical or C3–C30 alkenyl radical, optionally bearing one or more hydroxyl substituents and optionally containing in the hydrocarbon chain one or more heteroatoms selected from among oxygen, nitrogen and silicon atoms, or an optionally substituted C6–C20 aryl radical;
- R′3 is a single valence bond or a linear or branched divalent C1–C30 alkylene or C3–C30 alkenylene radical, optionally bearing one or more hydroxyl substituents and optionally containing in the hydrocarbon chain one or more heteroatoms selected from among oxygen, nitrogen and silicon atoms;
- and the radicals A, which may be identical or different, are each an alkali metal cation, an ammonium group, a C1–C20 mono-, di- or trialkylammonium radical, a C2–C20 mono-, di- or trialkanolammonium radical, or a C5–C8 quaternary nitrogen-containing heterocyclic ring member, and a topically applicable, cosmetically/dermatologically acceptable medium therefor.
Dependencies are inferred from the claim text.