Method of manufacturing LCOS spacers
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChung Kuei Jen
Life of this patent
Estimating the term…
Loading patent…
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChung Kuei Jen
Estimating the term…
A method for forming a liquid crystal on silicon (LCOS) display spacer and groove in a multi-step etching process including providing silicon substrate including a first overlying dielectric insulating layer and metal pixel electrodes; forming a second dielectric insulating layer over the metal pixel electrodes; forming a hardmask layer over the second dielectric insulating layer; photolithographically patterning a resist layer formed over the hardmask layer and plasma etching the hardmask layer to form an etching mask for etching spacers in the second dielectric insulating layer; carrying out a first plasma etching process to form spacers; removing remaining resist layer portions and polymer etching residues over the process surface; and, carrying out a second plasma etching process to etch grooves between metal pixel electrodes adjacent the spacers.
A method for forming a liquid crystal on silicon (LCOS) display spacer and groove in a multi-step etching process comprising the steps of:
A method for forming a liquid crystal on silicon (LCOS) display spacer and groove in a multi-step etching process comprising the steps of:
Dependencies are inferred from the claim text.