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US 7,008,750 B2Granted
Processes for producing polysiloxanes and photoresist compositions comprising same
AssigneeShipley Company, L.L.C.
InventorsGeorge G. Barclay, Subbareddy Kanagasabapathy, Matthew A. King
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Abstract
New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
Claims19
A method for preparing a chemically-amplified positive photoresist composition, the method comprising:
- a) polymerizing one or more reactive silane compounds in the presence of a compound having multiple reactive nitrogen moieties to provide a siloxane polymer;
- and
- b) admixing the polymer with a photoactive component to provide a chemically-amplified positive photoresist composition.
A method for forming a photoresist relief image, the method comprising:
- a) polymerizing one or more reactive silane compounds in the presence of a compound having multiple reactive nitrogen moieties to provide a siloxane polymer;
- and
- b) admixing the polymer with a photoactive component to provide a chemically-amplified positive photoresist composition;
- c) applying a coating layer of the photoresist composition on a substrate;
- and
- d) exposing and developing the photoresist layer to provide a photoresist relief image.
3 more elements
Dependencies are inferred from the claim text.