Method and system for removal of contaminates from phaseshift photomasks
AssigneeMicron Technology, Inc.
InventorsShad Hedges, James Baugh
Life of this patent
Estimating the term…
Abstract
A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
Claims14
A system for cleaning a reticle used in photolithographic processing of microelectronic workpieces, the reticle including a plate with a photomask and a pellicle frame around the photomask, wherein the system comprises:
- a fixture configured to carry the plate;
- a lid spaced apart from the fixture, wherein the lid has an interface surface configured to seal against at least one of the plate and/or the pellicle frame;
- at least one fluid dispenser configured to dispense a fluid onto the pellicle frame;
- and
- a clamping assembly to press the interface surface against the plate.
A system for cleaning a reticle used in photolithographic processing of microelectronic workpieces, the reticle including a plate with a photomask and a pellicle frame around the photomask, wherein the system comprises:
- a holder configured to carry the reticle;
- a lid spaced apart from the holder, the lid having an interface surface configured to fit within the pellicle frame to form a barrier between the photomask and the pellicle frame;
- and
- at least one fluid dispenser configured to direct a fluid onto the pellicle frame.
In the fabrication of microelectronic devices, a method for cleaning a reticle comprising:
- mounting the reticle to a holder;
- disposing a cover relative to the reticle to form a fluid barrier between a photomask in the reticle and a pellicle frame around the photomask;
- and
- dispensing a cleaning fluid onto the pellicle frame.
A system for protecting a photomask area of a reticle, comprising:
- means for carrying the reticle, the reticle having a surface, wherein a pellicle frame is attached to the surface defining the photomask area;
- means for forming a barrier between the photomask area and the pellicle frame;
- and
- means for dispensing at least one fluid onto the reticle;
- wherein the barrier means includes a cover sealed to the reticle in a manner that prevents the fluid from contacting the photomask area.
Dependencies are inferred from the claim text.