Substrate processing method
AssigneeHitachi Kokusai Electric Inc.
InventorKouji Tometsuka
Life of this patent
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Abstract
A substrate processing apparatus includes a reaction chamber for simultaneously processing a plurality of process substrates, a boat for loading the process substrates into the reaction chamber, and a stocker for storing a multiple number of dummy substrates, at least a portion of the dummy substrates being loaded into the reaction chamber together with the process substrates through the use of the boat. A substrate cleaning process is carried out by loading dummy substrates to be cleaned into the reaction chamber through the use of the boat and introducing a cleaning gas into the reaction chamber.
Claims18
A substrate processing method for use in a substrate processing apparatus having a stocker which stores a multiplicity of dummy substrates;
- a reaction chamber which batch-processes a plurality of process substrates to be used for producing semiconductor products;
- and a boat which loads into the reaction chamber the process substrates and a portion of the dummy substrates stored in the stocker in order to process a film formed on the dummy substrates, the method comprising:
- transferring one or more dummy substrates selected among the dummy substrates stored in the stocker to the boat;
- moving the boat having said one or more dummy substrates thereon to the reaction chamber;
- and
- introducing a cleaning gas into the reaction chamber to clean said one or more dummy substrates within the reaction chamber.
A substrate processing method for use in a substrate processing apparatus having a processing chamber;
- a boat which loads a plurality of substrates into the processing chamber;
- and a stocker which stores at least dummy substrates loaded into the processing chamber together with substrates to be used for processing semiconductor products, where the substrates are processed to form a film thereon, the method comprising:
- transferring the dummy substrates stored in the stocker between the boat and the stocker;
- moving the boat having the dummy substrates thereon to the processing chamber:
- and
- supplying a cleaning gas into the processing chamber in order to clean the dummy substrates while the dummy substrates are held in the processing chamber.
A substrate processing method for use in a substrate processing apparatus having a processing chamber;
- a substrate support which supports in the processing chamber at least one substrate to be used for producing semiconductor products or at least one of dummy substrate;
- and a stocker which stores the dummy substrate, the method comprising:
- transferring to the substrate support from the stocker the dummy substrate which has/have been processed to form a film thereon in the chamber;
- and
- supplying a cleaning gas into the processing chamber while the dummy substrate which has/have been processed to form a film thereon in the processing chamber is/are supported by the substrate support in the processing chamber.
Dependencies are inferred from the claim text.