Display device and method of manufacturing the same

A display device comprising:

• a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electooptic substance held in the gap between the first substrate and the second substrate;
• a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film being formed on the first substrate;
• an opposite electrode being formed vis-a-vis the set of pixel electrodes on the second substrate;
• and
• the planarizing film of the display device being made of a photosensitive material and formed to have a varying thickness in the first substrate by means of an exposure process,
• wherein different display colors are assigned to the pixel electrodes and the planarizing film is formed to have a thickness that varies according to the wavelength of the display color assigned to each of the pixel electrodes.

A method of manufacturing a display device having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electrooptic substance held in the gap between the first substrate and the second substrate, said method including:

• a step of forming a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film on the first substrate, and forming an opposite electrode vis-a-vis the set of pixel electrodes on the second substrate;
• said step of forming said planarizing film including:
• an application step of applying a photosensitive material onto the first substrate;
• an exposure step of subjecting the planarizing film to an exposure process using a varied planar distribution of quantity of exposure light;
• and
• a processing step of processing the planarizing film so as to make it have a thickness varied according to the planar distribution of quantity of exposure light, by etching the surface of the exposed planarizing film,
• wherein the planarizing film is exposed to light for a plurality of times in the exposure step, using a plurality of masks, in order to irradiate light to the planarizing film with a predetermined quantity of energy.

A method of manufacturing a display device having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electrooptic substance held in the gap between the first substrate and the second substrate, said method including:

• a step of forming a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film on the first substrate, and forming an opposite electrode vis-a-vis the set of pixel electrodes on the second substrate;
• said step of forming said planarizing film including:
• an application step of applying a photosensitive material onto the first substrate;
• an exposure step of subjecting the planarizing film to an exposure process using a varied planar distribution of quantity of exposure light;
• and
• a processing step of processing the planarizing film so as to make it have a thickness varied according to the planar distribution of quantity of exposure light, by etching the surface of the exposed planarizing film,
• wherein light is irradiated onto the planarizing film by way of a mask having a varied planar distribution of transmission factor in the exposure step,
• wherein a single mask provided with a filter having predetermined parts adapted to irradiate light to the planarizing film with different respective quantities of energy is used in said exposure step, and
• wherein a filter made of two or more than two light shielding substances having different light transmission factors is used in the exposure step.

A method of manufacturing a display device having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electooptic substance held in the gap between the first substrate and the second substrate, said method including:

• a step forming a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the plaraizing film on the first substrate, and forming an opposite electrode vis-a-vis the set of pixel electrodes on the second substrate;
• said step of forming said planarizing film including;
• an application step of applying a photosensitive material onto the first substrate;
• an exposure step of subjecting the planarizing film to an exposure process using a varied planar distribution of quantity of exposure light;
• and
• a processing step of processing the planarizing film so as to make it have a thickness varied according to the planar distribution of quantity of exposure light, by etching the surface of the exposed planarizing film,
• wherein light is irradiated onto the planarizing film by way of a mask having a varied planar distribution of transmission factor in the exposure step,
• wherein a single mask provided with a filter having a predetermined parts adapted to irradiate light to the planarizing film with different respective quantities of energy is used in said exposure step, and
• wherein a mask provided with a filter having a light transmission factor between 1% and 50% is used in the exposure step.

A method of manufacturing a display device having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electrooptic substance held in the gap between the first substrate and the second substrate, said method including:

• a step forming a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film on the first substrate, and forming an opposite electrode vis-a-vis set of pixel electrodes on the second substrate;
• said step of forming said planarizing film including:
• an application step of applying a photosensitive material onto the first substrate;
• an exposure step of subjecting the planarizing film to an exposure process using a varied planar distribution of quantity of exposure light;
• and
• a processing step of processing the planarizing film so as to make it have a thickness varied according to the planar distribution of quantity of exposure light, by etching the surface of the exposed planarizing film,
• wherein a pixel array section comprising pixel electrodes and thin film transistors for driving the pixel electrodes and a drive circuit section comprising thin film transistors for driving the pixel array section are formed on one of said substrates;
• and
• said planarizing film is formed to extend from the pixel array section to the peripheral drive circuit section and have a film thickness differentiated between the pixel array section and the drive circuit section.

A method of manufacturing a display device having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electrooptic substance held in the gap between the first substrate and the second substrate, said method including:

• a step of forming a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film on the first substrate, and forming an opposite electrode vis-a-vis the set of pixel electrodes on the second substrate;
• said step of forming said planarizing film including:
• an application step of applying a photosensitive material onto the first substrate;
• an exposure step of subjecting the planarizing film to an exposure process using a varied planar distribution of quanity of exposure light;
• and
• a processing step of processing the planarizing film so as to make it have a thickness varied according to the planar distribution of quantity of exposure light, by etching the surface of the exposed planarizing film,
• wherein different display colors are assigned to the pixel electrodes and the thickness of the parts of said planarizing film corresponding to the pixel electrodes are made to vary according to the wavelengths of the display colors assigned to the respective pixel electrodes.

A cellular phone terminal device comprising an operating section for operations relating to making a call and receiving a call, a talking section allowing telephone conversation to take place after making a call or receiving a call, and a display section for displaying information relating at least to the operation for the call;

• said display section having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electro optic substance held in the gap between the first substrate and the second substrate;
• a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film being formed on the first substrate;
• an opposite electrode being formed vis-a-vis the set of pixel electrodes on the second substrate;
• and
• the planarizing film of the display device being made of a photosensitive material and formed to have a varying thickness in the first substrate by means of an exposure process,
• wherein said first substrate has thereon a pixel array section formed by the pixel electrodes and thin film transistors for driving the pixel electrodes and a drive circuit section formed by thin film transistors for driving the pixel array section, and
• said planarizing film is formed so as to extend from the pixel array section to the peripheral drive circuit section and have a thickness differentiated between the pixel array section and the drive circuit section.

A cellular phone terminal device comprising an operating section for operations relating to making a call and receiving a call, a talking section for allowing telephone conversation to take place after making a call or receiving a call, and a display section for displaying information relating at least to the operation for the call;

• said display section having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electro optic substance held in the gap between the first substrate and the second substrate;
• a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film being formed on the first substrate;
• an opposite electrode being formed vis-a-vis the set of pixel electrodes on the second substrate;
• and
• the planarizing film of the display device being made of a photosensitive material and formed to have a varying thickness in the first substrate by means of an exposure process,
• wherein different display colors are assigned to the pixel electrodes and the planarizing film is formed to have a thickness that varies according to the wavelength of the display color assigned to each of the pixel electrodes.

A portable information terminal device comprising an operating section for inputting instructions, a processing section for processing information according to instructions, and a display section for displaying processed information;

• said display section having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electrooptic substance held in the gap between the first substrate and the second substrate;
• a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film being formed on the first substrate;
• an opposite electrode being formed vis-a-vis the set of pixel electrodes on the second substrate;
• and
• the planarizing film of the display device being made of a photosensitive material and formed to have a varying thickness in the first substrate by means of an exposure process,
• wherein said first substrate has thereon a pixel array section formed by the pixel electrodes and thin film transistors for driving the pixel electrodes and a drive circuit section formed by thin film transistors for driving the pixel array section, and
• said planarizing film is formed so as to extend from the pixel array section to the peripheral drive circuit section and have a thickness differentiated between the pixel array section and the drive circuit section.

A portable information terminal device comprising an operating section for inputting instructions, a processing section for processing information according to instructions, and a display section for displaying processed information;

• said display section having a panel structure having a first substrate and a second substrate bonded to each other with a predetermined gap separating them and an electrooptic substance held in the gap between the first substrate and the second substrate;
• a set of thin film transistors, a planarizing film covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film being formed on the first substrate;
• an opposite electrode being formed vis-a-vis the set of pixel electrodes on the second substrate;
• and
• the planarizing film of the display device being made of a photosensitive material and formed to have a varying thickness in the first substrate by means of an exposure process,
• wherein different display colors are assigned to the pixel electrodes and the planarizing film is formed to have a thickness that varies according to the wavelength of the display color assigned to each of the pixel electrodes.