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US 7,002,168 B2Granted
Dense plasma focus radiation source
AssigneeCymer, Inc.
InventorsJonah Jacob, Joseph A. Mangano, James Moran, Alexander Bykanov, Rodney Petr, Mordechai Rokni
Life of this patent
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Abstract
A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode and cathode, for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber, and for feeding Lithium into the discharge chamber.
Claims72
A dense plasma focus radiation source comprising:
- a plasma radiation source adapted to produce extreme ultraviolet (EUV) radiation;
- a first gas jet providing a first gas stream at a first exit speed and having a first temperature;
- a second gas jet providing a second gas stream at a second exit speed substantially equal to the first exit speed and having a second temperature substantially equal to the first temperature, the first and second gas streams together comprising a gas curtain comprising a diffusion layer disposed between the first and second gas streams;
- and
- a first recovery duct positioned and sized so as to capture a substantial portion of the diffusion layer.
2 more elements
Dependencies are inferred from the claim text.