Thin specimen producing method and apparatus
AssigneeSII NanoTechnology Inc.
InventorsKouji Iwasaki, Yutaka Ikku
Life of this patent
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Abstract
A thin specimen producing method acquires a work amount in a 1-line scan by an FIB under a predetermined condition, measures a remaining work width of a thin film on an upper surface of a specimen by a microscopic length-measuring function, determines a required number of scan lines of work to reach a predetermined width by calculation, and executes a work to obtain a set thickness. The work amount in a one-line scan by the FIB under the predetermined condition is determined by working the specimen in scans of plural lines, measuring the etched dimension by the microscopic length-measuring function, and calculating an average work amount per one-line scan.
Claims7
A thin specimen producing method comprising the steps of:
- acquiring a work amount of a specimen in a one-line scan by a charged particle beam of a charged particle beam apparatus;
- measuring a remaining work width of the specimen by a microscopic length-measuring function of the charged particle beam apparatus;
- determining a required number of scan lines to reach a predetermined width by calculation;
- and
- executing a work to obtain a set thickness.
A thin specimen producing apparatus comprising:
- means for memorizing a thinning amount of a specimen in a one-line scan by a charged particle beam apparatus;
- means for acquiring a microscope image of an upper surface of the specimen thereby automatically measuring a remaining width of the specimen in a thinning process;
- means for calculating a required number of scan lines to reach a predetermined width based on the thinning amount per line and the remaining width of the specimen;
- and
- means for executing the required number of scans by the charged particle beam apparatus.
Dependencies are inferred from the claim text.