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US 7,001,788 B2Granted
Maskless fabrication of waveguide mirrors
AssigneeApplied Materials, Inc.
InventorsFrancisco A. Leon, Lawrence C. West, Gregory L. Wojcik, Yuichi Wada
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Abstract
A method of fabricating a waveguide mirror that involves etching a trench in a silicon substrate; depositing a film (e.g. silicon dioxide) over the surface of the silicon substrate and into the trench; ion etching the film to remove at least some of the deposited silicon dioxide and to leave a facet of film in inside corners of the trench; depositing a layer of SiGe over the substrate to fill up the trench; and planarizing the deposited SiGe to remove the SiGe from above the level of the trench.
Claims11
A method of fabricating a waveguide mirror, said method comprising:
- etching a trench in a substrate;
- depositing a film over the surface of the substrate and into the trench;
- etching the film to remove at least some of the deposited film and to leave an angled surface of film in an inside corner of the trench;
- depositing a layer of semiconductor over the substrate to fill up the trench;
- planarizing the deposited semiconductor to remove the semiconductor from above the level of the trench,
- wherein the angled surface of film produces a reflecting surface of the waveguide mirror that is arranged to direct light out of or into the trench.
3 more elements
Dependencies are inferred from the claim text.