Method of manufacturing substrate for liquid crystal display device and method of manufacturing liquid crystal display device using same

Abstract

The present invention provides a method of manufacturing a substrate for MVA type or transreflective liquid crystal display device capable of obtaining a substrate for liquid crystal display device having a good display quality while simplifying the production process and a method of manufacturing a liquid crystal display device using same. A positive-working resist is spread over a glass substrate to form a resist layer thereon. The resist layer is exposed to light and developed to form a resist pattern having linear patterns. The linear pattern in the resist pattern is then irradiated with ultraviolet rays. The resist pattern is then subjected to heat treatment at a predetermined temperature to form a structure having a flat portion formed by the melt flow of the linear pattern irradiated with ultraviolet rays and a protrusion formed by the reflow of the linear pattern unirradiated with ultraviolet rays.

Dependencies are inferred from the claim text.