Exposure method, exposure apparatus, and method of production of device

An exposure method for successively exposing a plurality of sensitive substrates by an exposure apparatus having a first substrate stage and a second substrate stage, the exposure method comprising:

• selectively loading said plurality of sensitive substrates at either of said first and second substrate stages based on information showing a processing history of each of said plurality of sensitive substrates;
• wherein one of the plurality of sensitive substrates loaded on the first substrate stage is exposed with an exposure beam by an optical system, and another sensitive substrate loaded on the second substrate stage is exposed with the exposure beam by the optical system.

An exposure method for successively exposing a plurality of sensitive substrates by an exposure apparatus having a first substrate stage, a second substrate stage, and a common optical system that exposes sensitive substrates loaded on the first substrate stage when the first substrate stage is disposed at an exposure position and that exposes sensitive substrates loaded on the second substrate stage when the second substrate stage is disposed at the exposure position, the exposure method comprising:

• loading a first group of the plurality of sensitive substrates onto the first substrate stage based on a determination that the first group has been processed by a first processing system;
• and
• loading a second group of the plurality of sensitive substrates onto the second substrate stage based on a determination that the second group has been processed by a second processing system that is different from the first processing system but that performs a same processing as the first processing system.