Method and apparatus for improved focus ring
AssigneeTokyo Electron Limited
InventorsMichael Landis, Steven T Fink
Life of this patent
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Abstract
A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.
Claims16
A focus ring assembly for surrounding a substrate on a substrate holder in a plasma processing system comprising:
- a centering ring configured to be coupled to said substrate holder;
- and
- a focus ring comprising an upper surface, a lower surface, and one or more wear indicators coupled to at least one of said upper surface and said lower surface, wherein said focus ring is configured to be centered about said substrate by coupling said focus ring to said centering ring.
A disposable focus ring for surrounding a substrate on a substrate holder in a plasma processing system comprising:
- a ring configured to be coupled to said substrate holder comprising an upper surface, a lower surface, and one or more wear indicators coupled to at least one of said upper surface and said lower surface,
- wherein said ring is configured to be centered about said substrate by coupling said ring to said substrate holder, and
- wherein said one or more wear indicators comprise a hole in said upper surface or lower surface and extending to a depth from said upper surface or said lower surface, said depth comprising a fraction of the distance between said upper surface and said lower surface.
A method of replacing a focus ring surrounding a substrate on a substrate holder in a plasma processing system comprising:
- removing a first focus ring from said plasma processing system;
- and
- installing a second focus ring in said plasma processing system by coupling said second focus ring to said substrate holder, said coupling facilitating auto-centering of said second focus ring in said plasma processing system,
- wherein said first focus ring and said second focus ring each comprise an upper surface, a lower surface, and one or more wear indicators coupled to at least one of said upper surface and said lower surface, and
- wherein said one or more wear indicators comprise a hole in said upper surface or lower surface and extending to a depth from said upper surface or said lower surface, said depth comprising a fraction of the distance between said upper surface and said lower surface.
A focus ring assembly for surrounding a substrate on a substrate holder in a plasma processing system comprising:
- a centering ring configured to be coupled to said substrate holder;
- and
- a focus ring comprising an upper surface, a lower surface, and one or more wear indicators coupled to at least one of said upper surface and said lower surface, wherein said focus ring is configured to be centered about said substrate by coupling said focus ring to said centering ring,
- wherein said centering ring is coupled to said substrate holder by at least one of said centering ring resting atop said substrate holder, said centering ring being mechanically clamped to said substrate holder, and said centering ring being electrically clamped to said substrate holder.
Dependencies are inferred from the claim text.