Piezoelectric thin film and method for preparation theof, and piezoelectric element having the piezoelectric thin film, ink-jet head using the piezoelectric element, and ink-jet recording device having the ink-jet head

A method for manufacturing a piezoelectric thin film comprising:

• forming a first layer having a thickness of 0.005 μm to 0.05 μm on a substrate by using a target of lead lanthanum titan ate for sputtering, and
• forming a piezoelectric thin film on the first layer by using a target of lead zirconate titanate including an excess lead oxide for sputtering,
• wherein the first layer comprises perovskite crystals with a c-axis growing perpendicularly to a surface of the substrate, and
• the piezoelectric thin film has a chemical composition expressed by Pb1+a(ZrxTi1−x)O3+a (0.2≦a≦0.6 and 0.50≦x≦0.62) and comprises a perovskite columnar crystal region having an ionic defect in which a portion of the constitutive elements of an oxygen ion, a titanium ion, and a zirconium ion is missing, and a perovskite columnar crystal region of stoichiometric composition having no ionic defect.

A piezoelectric element comprising:

• a pair of electrodes;
• and
• a piezoelectric thin film formed between the pair of electrodes,
• wherein the piezoelectric thin film has a chemical composition expressed by Pb1+a(ZrxTi1−x)O3+a (0.2≦a≦0.6 and 0.50≦x≦0.62) and comprises a perovskite columnar crystal region having an ionic defect in which a portion of the constitutive elements of an oxygen ion, a titanium ion, and a zirconium ion is missing, and a perovskite columnar crystal region of stoichiometric composition having no ionic defect.