Projection optical system and projection exposure apparatus

A projection exposure apparatus for projecting an image of an object onto an image plane, said apparatus comprising:

• a first imaging optical system for forming an intermediate image of the object, said first imaging optical system including (i) a first lens unit having a positive power, (ii) a first optical unit having a first mirror for reflecting and collecting abaxial light from the object, (iii) a second optical unit having a second mirror for reflecting light from said first mirror to the image plane side, with which the abaxial light is caused to pass an outside of an effective diameter of said first mirror, and (iv) a second lens unit having a negative power and being disposed between said first and second mirrors;
• a second imaging optical system for re-imaging the intermediate image upon the image plane, said second imaging optical system being composed of a plurality of lenses;
• and
• a field optical system disposed between said first imaging optical system and said second imaging optical system, for projecting a pupil of said first imaging optical system onto said second imaging optical system, said field optical system including three lenses each having a positive power,
• wherein, in a meridional plane, the abaxial light passes through only one side of said three lenses with respect to the optical axis, and
• wherein said first imaging optical system, said second imaging optical system and said field optical system are disposed along a common straight optical axis.