Liquid crystal display device and method of fabricating the same
AssigneeLG.Philips LCD Co., Ltd.
InventorsWoo Hyuk Choi, Sang Chul Lee
Life of this patent
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Abstract
A liquid crystal display device includes a gate line having a first width formed extending along a first direction on a substrate, a gate insulation film formed to cover the gate line, a semiconductor layer formed on the gate insulation film, a storage contact hole having a first width exposing a portion of the semiconductor layer, and a pixel electrode having a first end portion extending along a second direction perpendicular to the first direction to electrically contact the semiconductor layer through the storage contact hole, the first end portion has a first length larger than the first width of the gate line, wherein the first width of the storage contact hole is larger than the first width of the gate line.
Claims29
A liquid crystal display device, comprising:
- a gate line having a first width formed extending along a first direction on a substrate;
- a gate insulation film formed to cover the gate line;
- a semiconductor layer formed on the gate insulation film;
- a storage contact hole through a portion of the semiconductor layer having a first width exposing a portion of the semiconductor layer;
- and
- a pixel electrode having a first end portion extending along a second direction perpendicular to the first direction to electrically contact the semiconductor layer through the storage contact hole, the first end portion has a first length larger than the first width of the gate line,
- wherein the first width of the storage contact hole is larger than the first width of the gate line.
A method of fabricating a liquid crystal display device, comprising:
- forming a gate line on a substrate using a first mask;
- depositing a first insulation layer, a semiconductor layer, and a data metal layer on the substrate to cover the gate line;
- forming a semiconductor layer by simultaneously patterning the first insulation layer, the semiconductor layer, and data metal layer using a second mask;
- depositing a second insulation layer on the substrate to cover the semiconductor layer;
- forming a first contact hole through the second insulation layer and the semiconductor layer by patterning the second insulation layer using a third mask;
- and
- forming a pixel electrode on the second insulation layer to extend across the gate line using a fourth mask,
- wherein a width of the first contact hole is larger than a width of the gate line.
A method of fabricating a liquid crystal display device, comprising:
- forming a gate line having a first width to extend along a first direction on a substrate;
- forming a gate insulation film to cover the gate line;
- forming a semiconductor layer on the gate insulation film;
- forming a storage contact hole having a first width to expose a portion of the semiconductor layer;
- and
- forming a pixel electrode having a first end portion to extend along a second direction perpendicular to the first direction to electrically contact the semiconductor layer through the storage contact hole, the first end portion has a first length larger than the first width of the gate line,
- wherein the first width of the storage contact hole is larger than the first width of the gate line.
A liquid crystal display device, comprising:
- a gate line having a first width formed extending along a first direction on a substrate;
- a gate insulation film formed to cover the gate line;
- a semiconductor layer formed on the gate insulation film;
- a storage contact hole through a portion of the semiconductor layer having a first width exposing a portion of the semiconductor layer;
- and
- a pixel electrode having a first end portion extending along a second direction perpendicular to the first direction to electrically contact the semiconductor layer through the storage contact hole.
A method of fabricating a liquid crystal display device, comprising:
- forming a gate line on a substrate using a first mask;
- depositing a first insulation layer, a semiconductor layer, and a data metal layer on the substrate to cover the gate line;
- forming a semiconductor layer by simultaneously patterning the first insulation layer, the semiconductor layer, and data metal layer using a second mask;
- depositing a second insulation layer on the substrate to cover the semiconductor layer;
- forming a first contact hole through the second insulation layer and the semiconductor layer by patterning the second insulation layer using a third mask;
- and
- forming a pixel electrode on the second insulation layer to extend across the gate line using a fourth mask.
A method of fabricating a liquid crystal display device, comprising:
- forming a gate line having a first width to extend along a first direction on a substrate;
- forming a gate insulation film to cover the gate line;
- forming a semiconductor layer on the gate insulation film;
- forming a storage contact hole having a first width to expose a portion of the semiconductor layer;
- and
- forming a pixel electrode having a first end portion to extend along a second direction perpendicular to the first direction to electrically contact the semiconductor layer through the storage contact hole.
A liquid crystal display device, comprising:
- a gate line on a substrate;
- a gate insulation film formed to cover the gate line;
- a semiconductor layer formed on the gate insulation film;
- a storage contact hole through a portion of the semiconductor layer exposing a portion of the semiconductor layer;
- and
- a pixel electrode having a first end portion electrically contacting the semiconductor layer through the storage contact hole.
Dependencies are inferred from the claim text.