Electron beam apparatus, and inspection instrument and inspection process thereof

A beam inspection apparatus for inspecting a specimen comprising:

• a beam source that discharges a beam;
• a primary optical system that directs the beam to the specimen;
• a secondary optical system that guides a secondary beam coming from the specimen;
• a sensor that outputs an electric signal of the specimen image from the secondary beam;
• an image processor that generates image information of the specimen by processing the electric signal output by the sensor;
• a stage system that holds the specimen and moves in at least one direction, the stage system having a laser interferometer for reading an x·y position of the stage and a stage controller that drives the stage,
• wherein the image information of the specimen generated by the image processor is compensated with regard to a specimen image displacement arising from a speed variation or a mechanical vibration of the stage system.

An electron beam inspection apparatus for inspecting a specimen, comprising:

• an electron beam source that discharges an electron beam;
• a primary optical system that directs the electron beam to the specimen;
• a sensor that outputs an electric signal of specimen information from a secondary beam;
• an information processor that generates information of the specimen by processing the electric signal output by the sensor;
• a stage system that holds the specimen and moves in at least one direction, the stage system having a laser interferometer that reads an x·y position of the stage and a stage controller that drives the stage,
• wherein the information of the specimen generated by the processor is compensated with regard to a specimen information displacement arising from a speed variation or a mechanical vibration of the stage system.

A beam inspection apparatus, comprising:

• a beam source that discharges a beam;
• a stage system that holds a specimen and moves continuously in at least one direction;
• a primary optical system that directs the beam to the specimen;
• a secondary optical system that guides a secondary beam coming from the specimen;
• a sensor that outputs an electric signal of the specimen image from the secondary beam;
• an image processor that generates image information of the specimen by processing the electric signal output by the sensor;
• and
• a host computer that generates an inspection timing signal for controlling the sensor to transfer the image information at a preset data transfer rate,
• wherein the stage system is moved at a speed in conformity to the inspection timing signal.