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US 6,958,312 B2Granted
Composition and method for removing copper-compatible resist
AssigneeLG.Philips LCD Co., Ltd.
InventorsGee-Sung Chae, Yong-Sup Hwang, Cyoo-Chul Jo, Oh-Nam Kwon, Kyoung-Mook Lee, Byung-Uk Kim, Sang-Dai Lee, Jong-Soon Yoo
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Abstract
A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
Claims5
A composition for removing a copper-compatible resist, comprising:
- about 10% to about 30% by weight of an amine compound;
- a glycolether compound;
- and
- a polar solvent,
- wherein the glycolether compound has a molecular weight of less than about 150, and the polar solvent includes at least one of N-methyl-2-pyrrolidinone, N,N-dimethylacetamide, N,N-dimethylformamide, and N,N-dimethylimidazole;
- and
- wherein at least one of the glycolether compound and the polar solvent is about 45% by weight.
4 more elements
Dependencies are inferred from the claim text.