Deposition of dispersed metal particles onto substrates using supercritical fluids
AssigneeColumbian Chemicals Company
InventorGarth Desmond Brown
Life of this patent
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Abstract
A method for producing dispersed metal particles on a substrate and the compositions produced is disclosed. A method for producing the particles comprises exposing an organometallic and a particulate substrate to supercritical or near supercritical fluid under conditions to form a mixture of the fluid and the organometallic, allowing the mixture to remain in contact with the substrate for a time sufficient to deposit dispersed organometallic onto the substrate, venting the mixture, thereby adsorbing the organometallic onto the substrate, and reducing the dispersed organometallic to dispersed metal particles with a reducing agent.
Claims31
A method for producing metal particles or mixed metal particles dispersed on a particulate substrate comprising
- a. exposing an organometallic and the particulate substrate to a supercritical or near supercritical fluid under conditions to form a mixture of the fluid and the organometallic,
- b. allowing the mixture to remain in contact with the substrate for a time sufficient to deposit dispersed organometallic onto the substrate,
- c. venting the mixture,
- d. thereby adsorbing the organometallic onto the substrate, and then
- e. reducing the dispersed organometallic to dispersed metal particles with a reducing agent.
A method for producing particulate substrate-supported dispersed metallic particles comprising
- a. mixing an organometallic in a supercritical or near supercritical fluid to form a mixture,
- b. exposing a particulate substrate to the mixture of a) under supercritical or near supercritical conditions for a period of time sufficient to deposit dispersed organometallic on the substrate,
- c. venting the mixture,
- d. thereby adsorbing the organometallic onto the substrate, and then
- e. reducing the organometallic to dispersed metal particles with a reducing agent.
A method for producing particulate substrate-supported dispersed metallic particles comprising
- a. adding a particulate substrate and an organometallic to a reactor,
- b. adding a supercritical fluid to the reactor to form a mixture with the organometallic,
- c. allowing the organometallic to remain in contact with the substrate for a time sufficient to deposit dispersed organometallic onto the substrate,
- d. venting the reactor,
- e. thereby adsorbing the organometallic onto the substrate, and then
- f. adding a gaseous reducing agent to the reactor, and
- g. contacting the reducing agent and organometallic until the organometallic is reduced to dispersed metal particles.
Dependencies are inferred from the claim text.