Physical vapor deposition targets, and methods of fabricating metallic materials
AssigneeHoneywell International Inc.
InventorsVladimir M. Segal, Stephane Ferrasse, Frank Alford
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Abstract
The invention includes a physical vapor deposition target composed of a face centered cubic unit cell metal or alloy and having a uniform grain size less than 30 microns, preferably less than 1 micron; and a uniform axial or planar <220> texture. Also described is a method for making sputtering targets. The method can comprise billet preparation; equal channel angular extrusion with a prescribed route and number of passes; and cross-rolling or forging subsequent to the equal channel angular extrusion.
Claims28
A physical vapor deposition target comprising a material with a face centered cubic unit cell, having a sputtering surface, and formed by a process comprising:
- casting;
- equal channel angular extrusion;
- and
- after the equal channel angular extrusion, modifying crystallographic texture orientation by additional processing comprising at least one of cross-rolling and forging to enhance one of axial-oriented <220> and planar-oriented <220> crystallographic texture;
- the target having a (220) plane intensity contribution of at least about 60% relative to a total intensity contributed by (220), (200), (111) and (113) planes, a predominate <220> crystallographic texture across the sputtering surface, and an average grain size across the sputtering surface of less than or equal to about 30 microns.
A physical vapor deposition target comprising:
- a copper material with a face centered cubic unit cell;
- a (220) plane intensity of at least 60% based upon a total intensity of (220), (200), (111) and (113) planes;
- a predominate <220> crystallographic texture across a sputtering surface;
- and
- an average grain size across the sputtering surface of less than or equal to about 30 microns, wherein any second-phase precipitates present in the target have a maximum dimension of 0.5 micron.
A physical vapor deposition target comprising a material with a face centered cubic unit cell, the target comprising:
- a (220) plane intensity of at least about 60% based upon a total intensity of (220), (200), (111) and (113) planes;
- and
- at least one element selected from the group consisting of aluminum, copper, silver, gold, nickel, brass, cerium, cobalt, calcium, iron, lead, palladium, platinum, rhodium, strontium, ytterbium, and thorium.
Dependencies are inferred from the claim text.