Process chamber having component with yttrium-aluminum coating
OwnerNianci Han, Li Xu +1inventors
InventorsNianci Han, Li Xu, Hong Shih
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Abstract
A substrate processing chamber component is a structure having an integral surface coating comprising an yttrium-aluminum compound. The component may be fabricated by forming a metal alloy comprising yttrium and aluminum into the component shape and anodizing its surface to form an integral anodized surface coating. The chamber component may be also formed by ion implanting material in a preformed metal shape. The component may be one or more of a chamber wall, substrate support, substrate transport, gas supply, gas energizer and gas exhaust.
Claims27
A substrate processing chamber component capable of being exposed to a RF or microwave energized gas in a substrate processing chamber, the component comprising a metal alloy comprising yttrium and aluminum, the metal alloy having an anodized surface coating formed by applying an electrical bias power to the metal alloy, wherein the anodized surface coating comprises an yttrium-aluminum compound.
A substrate processing apparatus comprising:
- a process chamber having a wall about a process zone;
- a substrate transport capable of transporting a substrate into the process chamber;
- a substrate support capable of receiving a substrate;
- a gas supply capable of introducing a process gas into the process chamber,
- a gas energizer capable of energizing the process gas from the process chamber;
- and
- an exhaust capable of exhausting the proves, gas from the process chamber,
- wherein one or more of the process chamber wall, substrate support, substrate transport, gas supply, gas energizer and gas exhaust, comprises a metal alloy comprising yttrium and aluminum, the metal alloy having an anodized surface coating formed by applying an electrical bias power to the metal alloy, wherein the anodized surface coating comprises of an yttrium-aluminum compound.
A component for a substrate processing chamber that is capable of being exposed to a RF or microwave energized gas, the component comprising:
- a metal alloy comprising yttrium and aluminum metal alloy having a coating capable of being exposed to the RF or microwave energized gas in the substrate processing chamber, the coating comprising yttrium-aluminum oxide having a compositional gradient through a thickness of the coating.
A component for a substrate processing chamber that is capable of being exposed to a RF or microwave energized gas, the component comprising:
- a structure having a coating capable of being exposed to the RF or microwave energized gas in the substrate processing chamber, the coating comprising yttrium-aluminum oxide having a compositional gradient through a thickness of the coating, the yttrium-aluminum oxide comprising YAG.
A substrate processing apparatus comprising:
- a process chamber having a wall about a process zone;
- a substrate transport capable of transporting a substrate into the process chamber;
- a substrate support capable of receiving a substrate;
- a gas supply capable of introducing a process gee into the process chamber;
- a gas energizer capable of energizing the process gas in the process chamber;
- and
- an exhaust capable of exhausting the process gas from the process chamber,
- wherein one or more of the process chamber wall, substrate support, substrate transport, gas supply, gas energizer and gas exhaust, comprises a structure having a surface coating, the surface coating comprising yttrium-aluminum oxide having compositional gradient through a thickness of the coating.
Dependencies are inferred from the claim text.