Functional patterning material for imprint lithography processes

A method of forming an optical coupling device on a substrate, said method including:

• forming said substrate with a stress relief layer;
• disposing a material onto said stress relief layer that is polymerizable in response to actinic radiation;
• forming a plurality of spaced-apart stacks of said material by contacting said material with a template have a stepped-recess formed therein;
• and
• solidifying said plurality of spaced-apart stacks of said material into an optically transparent body with a surface having a plurality of steps by subjecting said stacks to actinic radiation.

A method of forming an optical coupling device on a substrate, said method including:

• forming, on said substrate, a stress relief layer formed from rubbers of a set of rubbers consisting essentially of polysiloxane rubber and fluorosilocane rubber;
• disposing a material, onto said stress relief layer, that is polymerizable in response to actinic radiation;
• forming a plurality of spaced-apart stacks of said material by contacting said material with a template having a stepped-recess formed therein;
• and
• solidifying said plurality of spaced-apart stacks of material into an optically transparent body with a surface having a plurality of steps by subjecting said stacks to actinic radiation.