Back to results
US 6,933,460 B2Granted
Method and device for plasma treatment of moving metal substrates
OwnerPierre Vanden Brande, Alain Weymeerschinventors
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
OwnerPierre Vanden Brande, Alain Weymeerschinventors
Estimating the term…
The invention relates to a method of treatment, in particular cleaning and/or heating, for a metal substrate (1) fed in a substantially continuous manner through a vacuum chamber (3), having a treatment zone in which an electric discharge (10), i.e. a plasma, and a magnetic field are produced in a gas maintained at a pressure below atmospheric pressure between at least the substrate (1), acting as an electrode, and at least one counter-electrode (9) to enable the substrate (1) to be bombarded by the ions produced in the electric discharge (10). This method is characterised in that a confining magnetic induction field is produced entirely around the substrate (1) in the treatment zone so that the electric discharge (10) is also confined entirely around the substrate (1) inside this treatment zone by the confinement of electrons released in the electric discharge (10).
Treatment method for cleaning and/or heating a metal substrate (1), comprising
Device for treating a metal comprising
Dependencies are inferred from the claim text.