Ultraviolet method of embedding structures in photocerams

A method of forming a three dimensional embedded structure in a photoceram, the method comprising,

• generating a laser beam at a predetermined wavelength within a weak absorption region of the photoceram,
• focusing the laser beam into a beam waist at a focal depth into the photoceram,
• illuminating the photoceram by the laser beam to expose a focal volume of the photoceram at a focal depth where the laser beam converts the photoceram into an amorphous exposed material in the focal volume,
• heating the amorphous exposed material for forming crystallized material from the amorphous exposed material in the focal volume, and
• dissolving the crystallized material in an acid for evacuating crystallized material from the focal volume and creating a focal volume vacancy defining the three dimensional embedded structure.

A method of forming a three dimensional embedded structure in a photoceram, the method comprising,

• generating a pulsed laser beam at a UV wavelength within a weak absorption band of the photoceram,
• focusing the laser beam into a beam waist at a focal depth into the photoceram,
• exposing the photoceram at the UV wavelength a predetermined number of pulses at focal depth for creating a pixelized volume of amorphous exposed material,
• moving the photoceram a predetermined step distance, and
• repeating the exposing and moving step a plurality of times for creating a respective plurality of pixelized volume forming a focal volume,
• heating the photoceram to heat the amorphous exposed material in the focal volume to bake the amorphous material into a crystallized material, and
• dissolving the crystallized material in an acid for evacuating the crystallized material from the focal volume creating a focal volume vacancy defining the three dimensional embedded structure.