Semiconductor device and process for fabricating the same

A method of manufacturing a semiconductor device comprising the steps of:

• forming a non-single crystalline semiconductor film over an insulating surface of a substrate;
• providing a material for promoting crystallization to the non-single crystalline semiconductor film;
• crystallizing the non-single crystalline semiconductor film by heating after providing the material;
• patterning the semiconductor film after the crystallization into at least one semiconductor island;
• irradiating the semiconductor island with laser light after patterning.

A method of manufacturing a semiconductor device comprising the steps of:

• forming a non-single crystalline semiconductor film over an insulating surface of a substrate;
• providing a material for promoting crystallization to the non-single crystalline semiconductor film;
• crystallizing the non-single crystalline semiconductor film by heating after providing the material;
• irradiating the semiconductor film with a laser light after heating,
• wherein the laser light has a peak of wavelength of 0.5 μm to 4 μm.

A method of manufacturing a semiconductor device comprising the steps of:

• forming a non-single crystalline semiconductor film over an insulating surface of a substrate;
• providing a material for promoting crystallization to the non-single crystalline semiconductor film;
• crystallizing the non-single crystalline semiconductor film by heating after providing the material;
• patterning the semiconductor film after the crystallization into at least one semiconductor island;
• irradiating the semiconductor island with laser light after patterning,
• wherein the laser light has a peak of wavelength of 0.5 μm to 4 μm.